| Numéro |
2013
UVX2012 - 11e Colloque sur les Sources Cohérentes et Incohérentes UV, VUV et X ; Applications et Développements Récents
|
|
|---|---|---|
| Numéro d'article | 02003 | |
| Nombre de pages | 6 | |
| Section | Affiches | |
| DOI | https://doi.org/10.1051/uvx/201302003 | |
| Publié en ligne | 9 avril 2013 | |
Fabrication of microcraters on silicon substrate by UV nanosecond photonic nanojets from microspheres
1 LP3, UMR 7341 CNRS – Aix-Marseille Université, Case 917, 163 avenue de Luminy, 13288 Marseille Cedex 09, France
2 ISM, UMR 5255 CNRS – Université Bordeaux I, Bâtiment A12, 351 bld. de la libération, 33405 Talence Cedex, France
3 ICMCB, UPR 9048 CNRS, 87 avenue du Docteur Schweitzer, 33608 Pessac Cedex, France
We report briefly on the fabrication of arrays of nano- and micro-craters on silicon (Si) substrates using films of C18 functionalized 1 μm silica (SiO2) particles deposited by the Langmuir-Blodgett (LB) technique. The films are illuminated with UV nanosecond laser pulses. Local substrate ablation is observed at low fluences well below the damage threshold of silicon (1 J/cm2). The result is quantitatively explained through FDTD simulations of the micro lensing effect associated with the microspheres. Change in feature size and morphology with number of shots and laser fluence is investigated. In multi-shot irradiation experiments, the produced arrays of well-defined craters rely on the combination of direct laser ablation and laser surface cleaning or annealing as evidenced by Atomic Force Microscopy (AFM) technique.
© Owned by the authors, published by EDP Sciences, 2013
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 2.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.