SiO2 thin-film nanopatterning by UV laser illumination of self-assembled microsphere monolayers
1 LP3–UMR 6182 CNRS/Aix-Marseille Université, Marseille, France
2 LPCML–UMR5620 CNRS/Université Lyon 1, Villeurbanne, France
By illuminating transparent microsphere monolayers with single UV nanosecond laser pulses, we produce arrays of nanopatterns in oxide film on silicon. The reported features reveal the nature of the interaction of the photonic nanojets inside the oxide layer and at the highly absorbing substrate surface depending on the film thickness and the laser pulse energy.
© Owned by the authors, published by EDP Sciences, 2011