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Numéro
UVX 2008
2009
UVX 2008 - 9e Colloque sur les Sources Cohérentes et Incohérentes UV, VUV et X ; Applications et Développements Récents
Page(s) 173 - 176
DOI https://doi.org/10.1051/uvx/2009028
Publié en ligne 7 juillet 2009
UVX 2008 (2009) 173-176
DOI: 10.1051/uvx/2009028

Study on the transfer induced by laser of organic conducting thin films

L. Rapp, C. Cibert, A.P. Alloncle and P. Delaporte

Lasers, Plasmas et Photonic Processes Laboratory (LP3), UMR 6182 CNRS University of Méditerranée, C. 917, 13288 Marseille Cedex 9, France


Published online: 7 July 2009

Abstract
The Laser-Induced Forward Transfer (LIFT) [J. Bohandy et al., J. Appl. Phys. 63 (4), (1988) 1158.] technique has been performed on thin layers of organic conducting material for applications in plastic micro-electronics. This simple, single step, direct printing technique enables to make surface micro patterning or localized deposition of material. This process is a promising alternative for manufacture of organic electronic components on flexible supports when usual techniques, such like ink jet printing, cannot be considered. For instance, when the organic material has no solubility properties or when complex architectures are needed. It can be applied to sensitive materials without altering their properties [D. B. Chrisey et al., Chem. Rev. 103, (2003) 553-576; J. M. Fernández-Pradas et al., Thin Solid Films, 453-454, (2004) 27-30]. This opens the way to alternative manufacturing processes for the Organic Field-Effect Transistor (OFET) technology. The ejected material is highly forward directed, with an angular divergence on the order of 3° while propagating over a distance of 2 mm. The high directivity of the ejection with picosecond pulses duration shows that complex micro-structures with a high spatial resolution can be performed using the no contact LIFT technique. The influence of the distance between the donor and acceptor substrates on process reliability is also discussed. Moreover no limitation is expected to miniaturization, which is a necessary requirement.



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