Open Access
| Numéro |
UVX 2008
2009
UVX 2008 - 9e Colloque sur les Sources Cohérentes et Incohérentes UV, VUV et X ; Applications et Développements Récents
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|---|---|---|
| Page(s) | 45 - 50 | |
| DOI | https://doi.org/10.1051/uvx/2009008 | |
| Publié en ligne | 7 juillet 2009 | |
UVX 2008 (2009) 45-50
DOI: 10.1051/uvx/2009008
1 Laboratoire d'Optique Applique ENSTA Palaiseau, France
2 Insituto Superior Tecnico, Av. Pais Rovisco, Lisbon, Portugal
Published online: 7 July 2009
© EDP Sciences 2009
DOI: 10.1051/uvx/2009008
High harmonics generation: Spatial characterisation and applications
J. Gautier1, P. Zeitoun1, A.S. Morlens1, S. Sebban1, C. Valentin1, E. Papalazarou1, J.P. Goddet1, G. Lambert1, G. Lambert1, T. Marchenko1 and M. Fajardo21 Laboratoire d'Optique Applique ENSTA Palaiseau, France
2 Insituto Superior Tecnico, Av. Pais Rovisco, Lisbon, Portugal
Published online: 7 July 2009
Abstract
We present a full optimization of the high harmonics wave-front thanks to the use of a soft x-ray Hartmann sensor. The sensor was calibrated using high harmonics source with a λ/50 accuracy. We observed relatively good high harmonics wave-front, two times the diffraction-limit, with astigmatism as the dominant aberration for any interaction parameters.The influence of high harmonic generation parameters was also studied in particularly the influence of the infra-red wave-front. This wave front quality allows applications by focalization of this beam. We present experiment we performed on damage target and holography.
© EDP Sciences 2009