Open Access
Numéro
UVX 2008
2009
UVX 2008 - 9e Colloque sur les Sources Cohérentes et Incohérentes UV, VUV et X ; Applications et Développements Récents
Page(s) 45 - 50
DOI https://doi.org/10.1051/uvx/2009008
Publié en ligne 7 juillet 2009
UVX 2008 (2009) 45-50
DOI: 10.1051/uvx/2009008

High harmonics generation: Spatial characterisation and applications

J. Gautier1, P. Zeitoun1, A.S. Morlens1, S. Sebban1, C. Valentin1, E. Papalazarou1, J.P. Goddet1, G. Lambert1, G. Lambert1, T. Marchenko1 and M. Fajardo2

1  Laboratoire d'Optique Applique ENSTA Palaiseau, France
2  Insituto Superior Tecnico, Av. Pais Rovisco, Lisbon, Portugal


Published online: 7 July 2009

Abstract
We present a full optimization of the high harmonics wave-front thanks to the use of a soft x-ray Hartmann sensor. The sensor was calibrated using high harmonics source with a λ/50 accuracy. We observed relatively good high harmonics wave-front, two times the diffraction-limit, with astigmatism as the dominant aberration for any interaction parameters.The influence of high harmonic generation parameters was also studied in particularly the influence of the infra-red wave-front. This wave front quality allows applications by focalization of this beam. We present experiment we performed on damage target and holography.



© EDP Sciences 2009

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